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4420P-2-560

4420P-2-560 Description

The 4420P-2-560 from Bourns Inc. is a high-performance 19-resistor bussed network designed for precision surface-mount applications. Encased in a compact 20-pin SOIC package with dimensions of 0.510" x 0.295" (12.95mm x 7.50mm) and a low-profile height of 0.114" (2.90mm), this resistor array offers a 56Ω resistance per element with a tight ±2% tolerance. Its ±100ppm/°C temperature coefficient and 50ppm/°C resistor-ratio drift ensure stable performance across varying environmental conditions. The device is rated for 160mW power per element and complies with REACH and ECCN EAR99 regulations, making it suitable for global markets.

4420P-2-560 Features

• 19-resistor bussed network for simplified circuit design.
• 56Ω resistance with ±2% tolerance for precision applications.
• Low TCR (±100ppm/°C) and 50ppm/°C ratio drift for thermal stability.
• Compact 20-pin SOIC package with MSL 1 (Unlimited) moisture sensitivity.
• 160mW power rating per element for robust performance.
• Surface-mount (SMD) design for automated assembly efficiency.
• Tape & Reel (TR) packaging for high-volume production.

4420P-2-560 Applications

Ideal for precision analog circuits, voltage dividers, and pull-up/pull-down networks, the 4420P-2-560 excels in:

• Industrial control systems requiring stable resistor networks.
• Consumer electronics (e.g., displays, sensors) where space and reliability are critical.
• Automotive electronics due to its robust thermal performance.
• Medical devices demanding low drift and high accuracy.
• Communication equipment for signal conditioning and impedance matching.

Conclusion of 4420P-2-560

The 4420P-2-560 stands out for its high density, precision, and thermal stability, making it a superior choice over discrete resistors in space-constrained designs. Its bussed architecture reduces PCB footprint, while Bourns' quality assurance ensures long-term reliability. Whether for industrial, automotive, or consumer applications, this resistor network delivers consistent performance under demanding conditions.